Mask Alignment System Market Subjected to Expand to Showcase Rampant Growth by 2023
Many of the manufacturers depend upon
nanotechnology solutions to produce various semiconductor components, such as
quantum dots and carbon nanotubes (CNTs). In order to produce essential
devices, the patterns for different lithography steps that belong to a single
structure must be properly aligned to each another. The first pattern
transferred to a wafer usually includes a set of alignment marks, which are high precision features that are used as the reference
when positioning subsequent patterns. These subsequent patterns are important
in identifying the size of wafer and also alignment. The complete design with
all mask layers combined is called the layout of the device. Enterprises typically
use software such as CAD/CAM specifically for designing the masks. One of the
major factors responsible for the growth of the mask alignment market is the
growing demand for nano sensors. Additionally, these factor also tend to fuel
the demand for semiconductor integrated chips for various different
applications, such as consumer electronic devices, communication systems,
sensor and detectors, and storage devices, increases.
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Key players
Some of the prominent key players in the
mask alignment system market include E V Group (Austria), Neutronix Inc (U.S.),
SÜSS MicroTec AG (Germany), Aixtron SE (Germany), Applied Materials, Inc
(U.S.), ASML Holding (Netherlands), Vistec Electron Beam GmbH (Germany), Veeco
Instruments, Inc (U.S.), Bruker Corporation (U.S.), among others.
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